65nm Technology
SAMSUNG’s 65nm process technology is a collaborative technology development initiative between SAMSUNG, IBM, Chartered and Infineon
65nm process offerings
- 65nm : Common Platform Library
- Various TR, Oxide and Backend stack options for customer's product and low-cost version of LP process
-
L6LP : 34 mask layers (6 metal stack) - 4 SG TR variants (HVT, RVT, LVT, ZVT)
- 2 Oxide variants (SG, DG)
-
L6G : 42 mask layers (6 metal stack)
- 4 SG TR variants (HVT, RVT, LVT, ZVT)
- 2 Oxide variants (SG, DG)
note:
- (1) Thin : Thin Gox
- (2) Thick : Thick Gox
- (3)
: 2.5V Stacked NFET or Optional 3.3V Process




