32nm Process Technology as the first HKMG in Foundry industry.
Samsung Foundry has qualified 32nm Low Power, High-K Metal Gate in Jun, 2010 which was the first HKMG product in foundry industry. Combining HK/MG with Gate first technology realized both extreme high performances and high area efficiency even without drastic changes in Poly-Si based conventional design methodology. 32nm HKMG process boasts up 30% higher speed, 30% less power, 30% scaling with twice of SRAM density over 45nm technology, making it ideal for high performance mobile applications. 32nm process is developed with abundant design ecosystem suitable for high performance mobile applications.