September 05, 2000 in Social Responsibility News

Investment on New Facility

1. Facility: Production lines (three) for next generation semiconductors.



2. Amount Invested (Won): 3,842,400,000,000

-proportion to capital (%): 436



3. Method of Fund Raising: Equity Capital



4. Products and Scale (Business Contents): D-RAM, S-RAM, ASIC, SYSTEM LSI Products, and 12"

PILOT Line



5. Reasons for Investment: Maintaining the competitiveness through maximization of revenue and profit



6. Investment Period: October 2000 ~ End of 2003



7. Location: Ki-Heung, On-Yang



8. Decision Date (Resolution date of the board of directors): September 04, 2000

- outside directors: present (no.) absent (no.)

- auditors: not present



9. The Others

- upon any changes occur in the future regarding this issue, the public will be notified immediately.


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